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A Fourier scatterometry setup is evaluated to recover the key parameters of optical phase gratings. Based on these parameters, systematic errors in the printing process of two photon polymerization (TPP) gray-scale lithography 3d printers can be compensated, namely tilt and curvature deviations. The proposed setup is significantly cheaper than a confocal microscope, which is usually used to determine calibrations parameters for compensation of the TPP printing process. The grating parameters recovered this way are compared to those obtained with a confocal microscope. A clear correlation between confocal and scatterometric measurements is first shown for structures containing either tilt or curvature. The correlation is also shown for structures containing a mixture of tilt and curvature errors (squared Pearson coefficient $r^2$ = 0.92). This new compensation method is demonstrated on a TPP printer: A diffractive optical element (DOE) printed with correction parameters obtained from Fourier scatterometry shows a significant reduction in noise as compared to the uncompensated system. This verifies the successful reduction of tilt and curvature errors. Further improvements of the method are proposed, which may enable the measurements to become more precise than confocal measurements in the future, since scatterometry is not affected by the diffraction limit.
Due to their user-friendliness and reliability, biometric systems have taken a central role in everyday digital identity management for all kinds of private, financial and governmental applications with increasing security requirements. A central security aspect of unsupervised biometric authentication systems is the presentation attack detection (PAD) mechanism, which defines the robustness to fake or altered biometric features. Artifacts like photos, artificial fingers, face masks and fake iris contact lenses are a general security threat for all biometric modalities. The Biometric Evaluation Center of the Institute of Safety and Security Research (ISF) at the University of Applied Sciences Bonn-Rhein-Sieg has specialized in the development of a near-infrared (NIR)-based contact-less detection technology that can distinguish between human skin and most artifact materials. This technology is highly adaptable and has already been successfully integrated into fingerprint scanners, face recognition devices and hand vein scanners. In this work, we introduce a cutting-edge, miniaturized near-infrared presentation attack detection (NIR-PAD) device. It includes an innovative signal processing chain and an integrated distance measurement feature to boost both reliability and resilience. We detail the device’s modular configuration and conceptual decisions, highlighting its suitability as a versatile platform for sensor fusion and seamless integration into future biometric systems. This paper elucidates the technological foundations and conceptual framework of the NIR-PAD reference platform, alongside an exploration of its potential applications and prospective enhancements.
A Fourier scatterometry setup is evaluated to recover the key parameters of optical phase gratings. Based on these parameters, systematic errors in the printing process of two-photon polymerization (TPP) gray-scale lithography three-dimensional printers can be compensated, namely tilt and curvature deviations. The proposed setup is significantly cheaper than a confocal microscope, which is usually used to determine calibration parameters for compensation of the TPP printing process. The grating parameters recovered this way are compared to those obtained with a confocal microscope. A clear correlation between confocal and scatterometric measurements is first shown for structures containing either tilt or curvature. The correlation is also shown for structures containing a mixture of tilt and curvature errors (squared Pearson coefficient r2 = 0.92). This compensation method is demonstrated on a TPP printer: a diffractive optical element printed with correction parameters obtained from Fourier scatterometry shows a significant reduction in noise as compared to the uncompensated system. This verifies the successful reduction of tilt and curvature errors. Further improvements of the method are proposed, which may enable the measurements to become more precise than confocal measurements in the future, since scatterometry is not affected by the diffraction limit.
